A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+
Solution-processing is a low-cost solution method to preparea variety of organic or inorganic thin films. For metal oxide compounds, a solution-processing solution of an organometallic compound is frequently used as a precursor to be spin coated, followed by a thermal annealing to form metal oxide....
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פורמט: | Online |
שפה: | eng |
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Universidad de Sonora
2023
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גישה מקוונת: | https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886 |
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biotecnia-article-1886 |
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record_format |
ojs |
institution |
Biotecnia |
collection |
OJS |
language |
eng |
format |
Online |
author |
Hernandez-Guzman, F Suarez Campos, Guillermo Cabrera-German, D Milan-Franco, MA Hu, H Quevedo-Lopez, MA Sotelo-Lerma, M |
spellingShingle |
Hernandez-Guzman, F Suarez Campos, Guillermo Cabrera-German, D Milan-Franco, MA Hu, H Quevedo-Lopez, MA Sotelo-Lerma, M A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ |
author_facet |
Hernandez-Guzman, F Suarez Campos, Guillermo Cabrera-German, D Milan-Franco, MA Hu, H Quevedo-Lopez, MA Sotelo-Lerma, M |
author_sort |
Hernandez-Guzman, F |
title |
A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ |
title_short |
A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ |
title_full |
A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ |
title_fullStr |
A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ |
title_full_unstemmed |
A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ |
title_sort |
simple solution method to prepare vo2:co2+ precursors for thin film deposition by solution-processing method: a simple solution method to prepare vo2:co2+ |
description |
Solution-processing is a low-cost solution method to preparea variety of organic or inorganic thin films. For metal oxide compounds, a solution-processing solution of an organometallic compound is frequently used as a precursor to be spin coated, followed by a thermal annealing to form metal oxide. In this work, vanadium oxide powders are obtained from a simple acid-base reaction, and then they are dispersed in isopropyl alcohol to form a solution for spin-coating. Different amount of cobalt salt are also added together with VOx into isopropyl alcohol to form VOx:Co2+ solutions. After thermal annealing at 200 °C, continuous transparent thin films are obtained. Optical, structural, morphological and chemical binding energies of those films are analyzed. It is found that amorphous VO2:Co2+ compound is formed in those films with V:Co atomic ratios between 6.6:1 and 1.6:1. Optical absorption onsets of those films are around 2.3 eV. An interesting interconnected porous morphology is observed when the atomic ratio of V:Co is around 4.9:1. It is concluded that porous amorphous cobalt doped vanadium oxide thin films can be obtained from a spin-coating process at low annealing temperature from a simple solution without any complex agent. |
publisher |
Universidad de Sonora |
publishDate |
2023 |
url |
https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886 |
work_keys_str_mv |
AT hernandezguzmanf asimplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT suarezcamposguillermo asimplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT cabreragermand asimplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT milanfrancoma asimplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT huh asimplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT quevedolopezma asimplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT sotelolermam asimplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT hernandezguzmanf unmetodosimpledesolucionparaprepararprecursoresdevo2co2paraladeposiciondepeliculadelgadamedianteelmetododeprocesamientoensolucionunmetodosimpledesolucionparaprepararpeliculasdelgadasdevo2co2 AT suarezcamposguillermo unmetodosimpledesolucionparaprepararprecursoresdevo2co2paraladeposiciondepeliculadelgadamedianteelmetododeprocesamientoensolucionunmetodosimpledesolucionparaprepararpeliculasdelgadasdevo2co2 AT cabreragermand unmetodosimpledesolucionparaprepararprecursoresdevo2co2paraladeposiciondepeliculadelgadamedianteelmetododeprocesamientoensolucionunmetodosimpledesolucionparaprepararpeliculasdelgadasdevo2co2 AT milanfrancoma unmetodosimpledesolucionparaprepararprecursoresdevo2co2paraladeposiciondepeliculadelgadamedianteelmetododeprocesamientoensolucionunmetodosimpledesolucionparaprepararpeliculasdelgadasdevo2co2 AT huh unmetodosimpledesolucionparaprepararprecursoresdevo2co2paraladeposiciondepeliculadelgadamedianteelmetododeprocesamientoensolucionunmetodosimpledesolucionparaprepararpeliculasdelgadasdevo2co2 AT quevedolopezma unmetodosimpledesolucionparaprepararprecursoresdevo2co2paraladeposiciondepeliculadelgadamedianteelmetododeprocesamientoensolucionunmetodosimpledesolucionparaprepararpeliculasdelgadasdevo2co2 AT sotelolermam unmetodosimpledesolucionparaprepararprecursoresdevo2co2paraladeposiciondepeliculadelgadamedianteelmetododeprocesamientoensolucionunmetodosimpledesolucionparaprepararpeliculasdelgadasdevo2co2 AT hernandezguzmanf simplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT suarezcamposguillermo simplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT cabreragermand simplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT milanfrancoma simplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT huh simplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT quevedolopezma simplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 AT sotelolermam simplesolutionmethodtopreparevo2co2precursorsforthinfilmdepositionbysolutionprocessingmethodasimplesolutionmethodtopreparevo2co2 |
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1781317595361705984 |
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biotecnia-article-18862023-06-22T17:10:31Z A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ Un método simple de solución para preparar precursores de VO2:Co2+ para la deposición de película delgada mediante el método de procesamiento en solución: Un método simple de solución para preparar películas delgadas de VO2:Co2+ Hernandez-Guzman, F Suarez Campos, Guillermo Cabrera-German, D Milan-Franco, MA Hu, H Quevedo-Lopez, MA Sotelo-Lerma, M cobalt doped vanadium oxide, spin-coated thin films, porous morphology, solution processing without ligands. oxido de vanadio dopado con cobalto, películas delgadas mediante recubrimiento centrifugo, morfología porosa, procesamiento de la solución sin complejantes. Solution-processing is a low-cost solution method to preparea variety of organic or inorganic thin films. For metal oxide compounds, a solution-processing solution of an organometallic compound is frequently used as a precursor to be spin coated, followed by a thermal annealing to form metal oxide. In this work, vanadium oxide powders are obtained from a simple acid-base reaction, and then they are dispersed in isopropyl alcohol to form a solution for spin-coating. Different amount of cobalt salt are also added together with VOx into isopropyl alcohol to form VOx:Co2+ solutions. After thermal annealing at 200 °C, continuous transparent thin films are obtained. Optical, structural, morphological and chemical binding energies of those films are analyzed. It is found that amorphous VO2:Co2+ compound is formed in those films with V:Co atomic ratios between 6.6:1 and 1.6:1. Optical absorption onsets of those films are around 2.3 eV. An interesting interconnected porous morphology is observed when the atomic ratio of V:Co is around 4.9:1. It is concluded that porous amorphous cobalt doped vanadium oxide thin films can be obtained from a spin-coating process at low annealing temperature from a simple solution without any complex agent. El procesamiento de soluciones es un método de bajo costo para preparar una variedad de películas delgadas orgánicas o inorgánicas. Para compuestos de óxidos metálicos, un procesamiento de solución de un compuesto organometálico se usa con frecuencia como solución precursora para ser recubierta por rotación, seguida de un tratamiento térmico para formar el óxido metálico. En este trabajo se obtienen polvos de óxido de vanadio a partir de una simple reacción ácido-base, y luego se dispersan en alcohol isopropílico para formar una solución para spin-coating. También se agregan diferentes cantidades de sal de cobalto junto con VOx en alcohol isopropílico para formar soluciones de VOx:Co2+. Después del tratamiento térmico a 200 °C, se obtienen películas delgadas transparentes. Se analizan las propiedades ópticas, estructurales, morfológicas y químicas. Se encontró que el compuesto VO2:Co2+ es amorfo y se obtiene con una relación atómica V:Co variada de 6.6:1-1.6:1. El material presenta una absorción óptica alrededor de 2.3 eV. Se observa una interesante morfología porosa interconectada cuando la relación atómica de V:Co es ~4.9:1. Se concluye que se pueden obtener películas delgadas amorfas porosas de VO2:Co2+ a partir del spin-coating a una baja temperatura de tratamiento utilizando una solución simple sin agente complejante. Universidad de Sonora 2023-05-23 info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion Original peer-reviewed articles Artículos originales evaluados por pares application/pdf text/html image/jpeg text/xml https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886 10.18633/biotecnia.v25i2.1886 Biotecnia; Vol. 25 No. 2 (2023): May - August; 146 - 152 Biotecnia; Vol. 25 Núm. 2 (2023): Mayo - Agosto; 146 - 152 1665-1456 1665-1456 eng https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886/855 https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886/856 https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886/857 https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886/887 Derechos de autor 2023 https://creativecommons.org/licenses/by-nc-sa/4.0 |